在化学合成中，采用硅基化进行羟基保护生成叔丁基甲基硅基醚是应用较多的方法之一。一般来说，在分子中羟基位阻不大时主要通过TBSCl对羟基进行保护。 但当羟基位阻较大时则采用较强的硅醚化试剂TBSOTf来实现。生成的叔丁基二甲基醚在多种有机反应中是相当稳定的，在一定条件下去保护时一般不会影响其他官能团。它在碱性水解时的稳定性约为三甲基硅醚的 104倍。它对碱稳定。相对来说对酸敏感些。TBS醚的生成和断裂的难易取决于空间因素，因此常常用于对多官能团，位阻不同的分子进行选择性保护。在伯、仲醇中，TBS基相对来说较易于与伯醇反应。TBS醚的断裂除了常用的四烷基氟化胺外，许多情况下也可用酸来断。当分子内没有对强酸敏感的官能基存在时，可用 HCl-MeOH, HCl-Dioxane 体系去除TBS，若有对强酸敏感的官能基存在时，则可选用AcOH-THF体系去除。

通过TBSCl进行羟基的叔丁基二甲基硅醚保护示例 

     The hydroxyl lactone 1, upon treatment withTBDMSCl (1.2 equiv) and imidazole (2.5 equiv.) in DMF (2 mL/g of 1) at 35oC for10 h, produced the silyl ether-lactone 2 in 96% yield.

 通过 TBSOTf 进行羟基的叔丁基二甲基硅醚保护示例

     To an ice-cold solution of 4.8 g ofpyridine (2.0 equiv) and 4.20 g of 1 in 30 mL of dry acetonitrile was added slowly 9.6 g oftert-butyldimethylsilyl triflate (36.2 mmol, 1.2 equiv).The reaction mixture was stirred for 5 h atroom temperature and then poured into 200 mL of saturated sodium bicarbonatesolution at 0oC. The solution was extracted thoroughly with hexane, and the organic extracts were driedover anhydrous potassium carbonate and filtered. Removal of the solvent under reducedpressure followed by distillation of the residue gave 6.29 g (82% yield). 

         通过 TBAF 脱 TBDPS 示例 

    To a solution of THP ether 1 (1.7 g, 3.3mmol) in THF (10 mL) was added a 1 M solution of tetrabutylammonium fluoride inTHF (5 mL, 5 mmol) at 22-24oC. The solution was stirred for 2 h and diluted with 100 mL (1:1) ofEt2O/EtOAc solution. The organic layer was separated and washed with H2O (3 ×100 mL). The water extract was washed with 2:1 Et2O/EtOAc solution (2 × 50 mL),and the organic layers were combined and dried over MgSO4. The solvent wasevaporated in vacuo, and the residue was chromatographed over silica gel using(5:1) hexanes/ethyl acetate solution togive 2 (0.75 g, 82%).

通过 AcOH-THF 脱 TBS 示例

    Selective removal of one of the TBDMS groups of 1 was accomplished by treatment with acetic acid-water-THF (13:7:3) (30°C, 15h) to give the monohydroxy compound 2 in 79% yield.